简介：Basedontheprinciplethatone-endedelectromagneticsurfacewavecandriveaplasmaantenna,therelationbetweentheeffectivelengthofanantennacolumnandtheappliedradiofrequency(RF)powerwasstudiedboththeoreticallyandexperimentally.Thedensitydistributionalongthcantennacolumnaswellastheelectrontemperatureindifferentconditionswereinvestigated.Thecharacteristicsofthereceptionoflocalfrequencymodulated(FM)electromagneticwavebytheplasmaantennawerecomparedwiththatbyacopperantennawithsamedimensions.Theresultsshowthatitisfeasibletotakeplasmaantennasasreceivingones.更多还原

简介：Anovelatmosphericplasmadevicedevelopedinthispaper,whichismoreeffectiveandconvenienttostudytheplasma-initiatedpolymerization(PIP)thanconventionalsetup.Thestructureandmechanismofthedeviceisintroduced.Someplasma-initiatedpolymerizationexperimentsarecarriedoutonthedevice,andtheconversionofAA(Acrylicacid)andAM(Acrylamide)atmospheric(N2)plasmapolymerizationarerespectively89%and94%after120hpostpolymerization,wherebyIRspectraoftheproduct(AA,AM).OurPIPresultareconfirmed.

简介：Wedevelopedaone-dimensionalhybridmodeltosimulatetheDC/RFcombineddrivencapacitivelycoupledplasmaforargondischarges.ThenumericalresultsareusedtoanalyzetheinfluenceoftheDCsourceontheplasmadensitydistribution,ionenergydistributions(IEDs)andionangledistributions(IADs)onboththeRFandDCelectrodes.TheincreaseinDCvoltagedrivesmorehigh-energyionstotheelectrodeappliedtotheDCsource,whichmakestheIEDsattheDCelectrodeshifttowardshigherenergy,andthepeaksintheIADsshifttowardssmallangleregions.Atthesametime,italsodecreasestheionenergyattheRFelectrodeandenlargestheincidentanglesoftheions,whichstriketheRFelectrode.

简介：Ananalyticalstudyispresentedonthemodaldispersioncharacteristics,groupvelocity,andeffectivegroup,aswellasthephaseindexofaternaryonedimensionalplasmaphotoniccrystalforanobliquelyincidentelectromagneticwaveconsideringtheeffectofcollisionsinplasmalayers.Thedispersionrelationisderivedbyusingthetransfermatrixmethodandtheboundaryconditionsbasedonelectromagnetictheory.Thedispersioncurvesareplottedforboththenormalphotonicbandgapstructureandtheabsorptionphotonicbandgapstructure.Itisfoundthattheincreaseintheangleofincidenceshiftsthephotonicbandgaptowardhigherfrequencies.Also,thecutofffrequencyisindependentofcollisions.

简介：本文通过对三聚氰胺(C3N6H6)的室温高压原位同步辐射能量散射x-ray衍射实验（EDXRD），在14．7GPa压力范围内，观察到常压下为单斜晶系的三聚氰胺经历了两次压致结构相变。在1．3GPa下，三聚氰胺分子晶体从单斜相转变为三斜相；在8．2GPa又转变为正交相。

简介：Anewtwo-dimensionalstructuremodulationalongc-andb-axeshasbeendiscoveredinsuperconductingsinglecrystalsofBi2.13Sr1.87CuO6+δ(Bi2201)byx-rayscattering.Suchmodulationstructuredoesnotexistinnon-superconductingBi2201singlecrystals.Butinsteadlatticedistortionsareobservedinthea-b-plane.Thisphenomenonmayindicatethatbothstrainrelaxationandchargemodulationinthea-b-planeareimportanttotheoccurrenceofsuperconductivityinthecopperoxides.

简介：Thisworkinvestigatesinternalplasmaprocessparametersusingahairpinresonanceprobeandopticalemissionspectroscopy.ThedependenceofelectrondensityandatomicfluorineonthepercentageofoxygeninanSF6/O2dischargewasmeasuredusingthesemethods.AnRIEOxfordInstruments80pluschamberwasusedfortheexperiments.Twodifferentprocesspowers(100Wand300W)ataconstantpressure(100mTorr)wereused,anditwasfoundthattheopticalemissionintensityofthe703.7nmand685.6nmlinesofatomicfluorineincreasedrapidlyasoxygenwasaddedtotheSF6discharge,reachedtheirmaximumatanO2fractionof20%andthendecreasedwithfurtheradditionofoxygen.TheplasmaelectrondensitywasalsostronglyinfluencedbytheadditionofO2.

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简介：ThisworkinvestigatedC2F6/O2/ArplasmachemistryanditseffectontheetchingcharacteristicsofSiCOHlow-kdielectricsin60MHz/2MHzdual-frequencycapacitivelycoupleddischarge.FortheC2F6/Arplasma,theincreaseinthelow-frequency(LF)powerledtoanincreasedionimpact,promptingthedissociationofC2F6withhigherreactionenergy.Asaresult,fluorocarbonradicalswithahighF/Cratiodecreased.Theincreaseinthedischargepressureledtoadecreaseintheelectrontemperature,resultinginthedecreaseofC2F6dissociation.FortheC2F6/O2/Arplasma,theincreaseintheLFpowerpromptedthereactionbetweenO2andC2F6,resultingintheeliminationofCF3andCF2radicals,andtheproductionofanF-richplasmaenvironment.TheF-richplasmaimprovedtheetchingcharacteristicsofSiCOHlow-kfilms,leadingtoahighetchingrateandasmoothetchedsurface.