学科分类
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2 个结果
  • 简介:Quantumeffectsplayanenhancementroleinp-pchainreactionsoccurringwithinstars.Suchanenhancementisquantifiedbyawavepenetrationfactorthatisproportionaltothedensityoftheparticipatingfuelparticles.Thisleadstoaninnovativetheoryfordenseplasma,anditsresultshowsgoodagreementwithindependentdataderivedfromthesolarenergyoutput.AnanalysisofthefirstZ-pinchmachineinmankind’shistoryexhibitingneutronemissionleadstoaderiveddeuteriumplasmabeamdensitygreaterthanthatofwater,withplasmavelocitiesexceeding10000km/s.Fusionpowercouldbeachievedbytheintersectionoffoursuchpinchedplasmabeamswithpowerfulhead-oncollisionsintheircommonfocalregionduetothebeamandtargetenhancedreaction.

  • 标签: 稠密等离子体 量子效应 粒子波 核聚变 链式反应 增强作用
  • 简介:Influenceoftheparametersofplasmaenhancedchemicalvapordeposition(PECVD)onthesurfacemorphologyofhydrogenatedamorphoussilicon(α-Si:H)filmwasinvestigated.Theroot-mean-square(RMS)roughnessofthefilmwasmeasuredbyatomicforcemicroscope(AFM)andtherelevantresultswereanalyzedusingthesurfacesmoothingmechanismoffilmdeposition.Itisshownthatanα-Si:HfilmwithsmoothsurfacemorphologycanbeobtainedbyincreasingthePH_3/N_2gasflow-ratefor10%inahighfrequency(HF)mode.Forhighpower,however,thesurfacemorphologyofthefilmwilldeterioratewhentheSiH_4gasflowrateincreases.Furthermore,optimizedparametersofPECVDforgrowingthefilmwithsmoothsurfacewereobtainedtobeSiH_4:25sccm(standardcubiccentimetersperminute),Ar:275sccm,10%PH_3/N_2:2sccm,HFpower:15W,pressure:0.9Torrandtemperature:350℃.Inaddition,forinthickfilmdepositiononsiliconsubstrate,aN_2OandNH_3preprocessingmethodisproposedtosuppresstheformationofgasbubbles.

  • 标签: 等离子体增强化学气相沉积 氢化非晶硅 表面形貌 薄膜制备 表面光滑 PECVD法