(Ni0.81Fe0.19)0.66Cr0.34hasahighresistivityandacrystalstructureclosetothatofNi0.81Fe0.19.TheelectricalandX-raydiffractionmeasurementsprovethatathinNiFeCrseedlayerinducesawell(111)-orientedNi0.81Fe0.19film.Post-annealingtreatmentimprovesthemagneticpropertiesof(Ni0.81Fe0.19)0.66Cr0.34(45A)/Ni0.81Fe0.19(150A)/Ta(55A)thinfilmpreparedunderadepositionfield,whereastheinter-diffu-sionofNiFe/Tadeterioratesthemagnetoresistancepropertiesofthefilm.
