Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature

(整期优先)网络出版时间:2009-02-12
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Siliconfilmsweregrownonaluminium-coatedglassbyinductivelycoupledplasmaCVDatroomtemperatureusingamixtureofSiH4andH2asthesourcegas.ThemicrostructureofthefilmswasevaluatedusingRamanspectroscopy,scanningelectronmicroscopyandatomicforcemicroscopy.Itwasfoundthatthefilmsarecomposedofcolumnargrainsandtheirsurfacesshowarandomanduniformdistributionofsiliconnanocones.Suchamicrostructureishighlyadvantageoustotheapplicationofthefilmsinsolarcellsandelectronemissiondevices.Fieldelectronemissionmeasurementofthefilmsdemonstratedthatthethresholdfieldstrengthisaslowas~9.8V/μmandtheelectronemissioncharacteristicisreproducible.Inaddition,amechanismissuggestedforthecolumnargrowthofcrystallinesiliconfilmsonaluminium-coatedglassatroomtemperature.