Siliconfilmsweregrownonaluminium-coatedglassbyinductivelycoupledplasmaCVDatroomtemperatureusingamixtureofSiH4andH2asthesourcegas.ThemicrostructureofthefilmswasevaluatedusingRamanspectroscopy,scanningelectronmicroscopyandatomicforcemicroscopy.Itwasfoundthatthefilmsarecomposedofcolumnargrainsandtheirsurfacesshowarandomanduniformdistributionofsiliconnanocones.Suchamicrostructureishighlyadvantageoustotheapplicationofthefilmsinsolarcellsandelectronemissiondevices.Fieldelectronemissionmeasurementofthefilmsdemonstratedthatthethresholdfieldstrengthisaslowas~9.8V/μmandtheelectronemissioncharacteristicisreproducible.Inaddition,amechanismissuggestedforthecolumnargrowthofcrystallinesiliconfilmsonaluminium-coatedglassatroomtemperature.