简介：

简介：磁控管劈啪作响被用来在micropowder表面上覆盖各种各样的金属。由使用这个方法，好粒子更好被驱散并且能因此同类地更涂。微粉末使用从烧煤的电力植物的苍蝇灰包括cenospheres(直径40200m和粒子密度0.7?汢湩?畦？

简介：In_2O_3∶SnO_2(ITO)thinfilmswerefabricatedonthesubstrateofflexiblepolyethyleneterephthalate(PET)byDCmagnetronsputteringfromaceramictargetofIn_2O_3/SnO_2(90∶10).PropertiesofthethinfilmswerecharacterizedbyX-raydiffraction(XRD),four-pointprobe,Hall-effectmeasurement,UV-Visspectrophotometer,andscanningelectronmicroscopy(SEM).Theeffectsofsputteringpressure,oxygenpartialpressureanddepositiontemperatureonpropertiesofmicrostructureandoptoelectronicspropertiesofPET/ITOthinfilmswereinvestigatedindetail.High-qualityITOthinfilmsonPETsubstrateswiththeresistivityaslowas8.5×10-4Ω·cmandtheopticaltransmittanceover80%inthevisiblespectrumrangewereobtained.

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简介：透明的传导性的铝做了锌氧化物(ZnO:艾尔，偶氮)电影被rf(收音机频率)在玻璃底层上准备磁控管从ZnO劈啪作响：3wt%艾尔2O3陶器的目标。氩气体压力的效果(PAr)与小变化被调查在这些电影的电、光、结构的性质上理解影响。使用X光检查衍射(XRD)并且扫描电子显微镜学(SEM)的结构的考试证明ZnO:薄电影是的艾尔(002)面向。抵抗力价值被四点的探查与5.76穩摥甠楳杮愠?灯楴業敺?票牤瑯敨浲污洠瑥潨?倠牵?桰獡?景?㈱?眠獡朠瑯愠?的最低抵抗力测量?潣灭牡瑡癩汥?潬敷?整灭牥瑡牵?挨愮??‰??楳瑳?景漠敮?睴?琠牨敥?牯映畯?慬敹獲漠?敭慴?晲捡獥瀠慬散?湩琠敨渠慥?楦汥?敲楧湯漠??業牣獯牴灩瀠瑡档愠瑮湥慮?桔?湡整湮?慲潤敭猠獹整?慧湩椠?浩牰癯摥戠????潣灭牡摥琠?桴?慰'?湡整湮?污湯?愠摮琠敨爠摡慩楴湯瀠瑡整湲栠污?吗潰敷?敢浡楷瑤?獩爠摥'转棳_??L潳灲楴湯瀠慥獫眠牥?獡楳湧?敧愠敲?吠敨栠杩汨?晥楦楣湥?L潳灲楴湯漠？

简介：金属涂的cenospheres广泛地在工业被使用了。不同涂层方法导致不同典型金属电影。由化学涂层的cenosphere上的金属电影不看起来很光滑，展出积累的金属和表面上的大头针洞并且离开某点uncoated。同时，金属电影紧没被吸收到cenospheres上并且是容易的开脱皮。然而，磁控管劈啪作响准备的金属电影是紧缩的，光滑并且在大头针洞外面。这部电影有好亲密关系到cenosphere表面。甚至当cenosphere被压碎时，如此的电影不用它分开。两个都，金属电影给一样的XRD模式，显示金属的水晶结构由这二个方法拍摄是一样。化学涂层是一个复杂过程并且有害环境，而是它适合极其细小的粉末涂层(粒子尺寸能是不到2)。磁控管劈啪作响的方法是环境的友好并且快速工作，但是这个方法要求特殊设计的设备并且不为极其细小的粉末工作。如果粒子尺寸是不到30，涂层过程是难的继续。

简介：Theinfluenceofthehystereticbehaviourinreactivesputteringwithapurealuminiumtargetinthepresenceofargonandoxygenplasmaontransmittanceandsurfacefreeenergyofaluminiumoxidefilmswasinvestigatedbyplasmaopticalemissionspectroscopytechnology.Theevolutionsofaluminium,andaluminiumoxideemissionlinesasfunctionsofoxygenflowrateatconstantpowerandpressurewerestudied.Asteeptransitionfromthemetallicsputteringtothecompoundsputteringwasobserveduponincreasingtheoxygenflowratefrom0.0SCCMtoabove2.0SCCM.Thenanoptimaldepositionzonewasobtainedthroughanalyzingthehystereticcurvesofaluminiumandaluminiumoxideemissionlines.TheevolutionofcrystalstructuresofsampleswasdiscernedbyX-raydiffractionspectradata.EnergydispersiveX-rayspectroscopydataalsodemonstratetherelationshipbetweenthechemicalcompositionsofaluminiumoxidefilmsandthehystereticbehaviour.Thefilmdepositedbetween1.5SCCMand2.0SCCMoxygenflowratedisplaysanoptimalandstoichiometicatomicratioofOtoAlandmassratioofOtoAl.ThechangesinthetransmittanceofsampleswerediscoveredtodependontheoxygenflowratebyUV-VIStransmittancespectra,andthechangesinsurfacefreeenergywerestudiedbycontactanglemeasurement.

简介：ThepurposeofthisstudywastoinvestigatetheeffectsofZrinterlayeronthestructureandmechanicalpropertiesofTiAlNfilms,whichweredepositedontheM2high-speedsteelsubstratesbymeansofplasma-enhancedmagnetronsputtering.TheresultshowsthatthecrystalorientationofZr/TiAlNfilmsissimilartothatofsingle-layeredTiAlNfilms,butthedifferenceisthatAlN(111)ofZr/TiAlNfilmsdisappearscompletely.WithrespecttoZrinterlayer,thetexturecoefficientofZr/TiAlNfilmsisapproximately1.Zr/TiAlNfilmsexhibitacompactisometricstructure,whichisdistinctlydifferentfromthecolumnarstructureexistinginthesingle-layeredTiAlNfilmsandTi/TiAlNfilms.ThehardnessandH3/E*2ofZr/TiAlNfilmsare,respectively,enhancedtobe36.6GPaand0.147.Withafewcracksemergingaroundtheindention,theadhesionstrengthofTiAlNfilmsisobviouslyadvancedbyaddingZrmetalinterlayer.

简介：有不同Cu内容的Ti/Cu/N涂层在钛上被扔由DC的合金表面磁控管劈啪作响技术。XPS和FESEM被采用在Ti6Al4V上描绘涂层的作文和结构底层。另外，粘附力量，磨擦，并且穿Ti/Cu/N涂层的性质被调查。显示出的试验性的结果涂层的粗糙的粒子将更成长，表面粗糙随在涂层满意的铜的增加增加；涂层显示出强壮的粘附力量；样品的涂层的磨擦系数是不到底层，至少到达0.19。涂层的wear抵抗能被优化并且控制Ti的相对内容改进，Cu，钛上的N元素合金表面，铜的10.98个特别at%内容。样品C2保留了最好穿抵抗。

简介：AluminumfilmscoatedonDIsteelsheetswerepreparedbydirectcurrent(DC)magnetronsputtering.Theinfluenceofthedepositionconditionsandfilmthicknessontheformabilityofcoatedsteelsheetswasstudied.TheresultsofthecuppingtestanddrawingtestshowthatthesubstratetemperatureandthicknessofAlfilmsarethekeyfactorsthataffectAladhesionandformabilityofcoatedsteelsheets.AdhesionbecameworsewhenthethicknessofAlsheetswasmorethan2μm.Andformabilitywasimprovedremarkablywhenthesubstratetemperaturewasincreasedto200℃.

简介：Zn_(1-x)Cu_xOthinfilmsweresynthesizedbytheradiofrequency(RF)magnetronsputteringtechniqueusingaZnOtargetcontainingdifferentpiecesofsmallCu-chips.X-raydiffraction(XRD)andscanningelectronmicroscopy(SEM)wereemployedtoanalyzethecrystallineandmicrostructureofthefihn,andX-rayphotoelectronspectroscopy(XPS)wasusedtoestablishthebondingcharacteristicsandoxidationstatesofcopperinsidetheZnOhost.Roomtemperature(RT)ferromagnetismwasobservedintheZn_(1-x)Cu_xOfilmsbyaQuantumDesignsuperconductingquantmninterferencedevice(SQUID)andthesaturationmagneticmomentofthefilmswasfoundtodecreasewiththeincreaseinCucontent.

简介：ZnMn2为抵抗随机存取存储器(RRAM)的O4电影被磁控管劈啪作响与不同设备结构制作。I-V特征，抵抗切换行为，耐力和ZnMn2O4电影被调查。ZnMn2象底部电极的O4电影，使用的希腊语的第二十三个字母和磅，展出双极的抵抗切换(BRS)行为处于低抵抗状态(LRS)处于高抵抗状态(HRS)和细丝传导机制由space-charge-limited传导(SCLC)统治了机制，但是ZnMn2用底部电极展出双极、单极的抵抗切换行为的n-Si的O4电影在幼虫由Poole-Frenkel(P-F)传导机制控制了Ag/ZnMn2O4/p-Si设备拥有最好的耐力和保留特征，交换周期的稳定的重复的数字在是超过1000，保留时间比106秒长。然而，最高的RHRS/R104的LRS比率和最低V在和V离开3.0的，V在Ag/ZnMn2O4/Pt设备。不过Ag/ZnMn2O4/n-Si设备也拥有最高的RHRS/R104,的LRS比率但是V在,V离开,RHRS和R象差的耐力一样的LRS,并且保留特征。

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简介：铝做了锌氧化物(偶氮)薄电影被DC磁控管在低底层温度劈啪作响准备。同轴的螺线管卷被放在磁控管目标附近提高血浆密度(Ji)。提高的血浆密度显著地改进了体积抵抗力()并且它在偶氮的电影的空间分发的同质。X光检查衍射(XRD)分析表明增加的Ji影响了crystallinity，压力松驰和另外的材料性质。偶氮的电影在模式显示出的低血浆密度(LPD)扔了显著变化在(从6.5ate温度固体氧化物燃料房间(SOFC)，哪个可能在500600点被操作?慀牲慥獲眠吗？

简介：是的Gd2O3薄电影高--门电介质被磁控管在1.3Pa和不同温度的一个压力劈啪作响在Si(001)底层上直接扔。X光检查衍射结果揭示了那从450～570慮挠牥浡捩洠瑡牥慩獬?潈?牰獥楳杮眠獡甠敳?潴映'L楲慣整愠畬業慮洠瑡楲?潣灭獯瑩獥椠?楮牴杯湥愠浴獯桰牥?牰瑯'虡N湯?楍牣獯牴'壮肭?种的所有电影湡?敭档湡捩污瀠潲数瑲敩?景琠敨挠浯潰楳整?敷敲琠獥整???慷?湩楤慣整?桴瑡琠敨戠湥楤杮猠牴湥瑧?湡?牦捡畴敲琠畯桧敮獳漠?污浵湩?慭牴硩挠牥浡捩挠浯潰楳整?楳瑮牥摥愠?????P

简介：AsinteredTi_(13)Cu_(87)targetwassputteredbyreactivedirectcurrent(DC)magnetronsputteringwithagasmixtureofargon/nitrogenfordifferentsputteringpowers.Titanium-copper-nitrogenthinfilmsweredepositedonSi(111),glassslideandpotassiumbromide(KBr)substrates.Phaseanalysisandstructuralpropertiesoftitanium-copper-nitrogenthinfilmswerestudiedbyX-raydiffraction(XRD).ThechemicalbondingwascharacterizedbyFouriertransforminfrared(FTIR)spectroscopy.TheresultsfromXRDshowthattheobservedphasesarenano-crystallitecubicantirheniumoxide(antiReO_3)structuresoftitaniumdopedCu_3N(Ti:Cu_3N)andnanocrystallitefacecenteredcubic(fcc)structuresofcopper.ScanningelectronmicroscopyandenergydispersiveX-rayspectroscopy(SEM/EDX)wereusedtodeterminethefilmmorphologyandatomictitanium/copperratio,respectively.Thefilmspossesscontinuousandagglomeratedstructurewithanatomictitanium/copperratio(～0.07)belowthatoftheoriginaltarget(～0.15).Thetransmittancespectraofthecompositefilmsweremeasuredintherangeof360nmto1100nm.Filmthickness,refractiveindexandextinctioncoefficientwereextractedfromthemeasuredtransmittanceusingareverseengineeringmethod.Inthevisiblerange,thehigherabsorptioncoefficientofthefilmspreparedatlowersputteringpowerindicatesmorenitrificationincomparisontothosepreparedathighersputteringpower.ThisisconsistentwiththeformationoflargerTi:Cu_3Ncrystallitesatlowersputteringpower.Thedepositionratevs.sputteringpowershowsanabrupttransitionfrommetallicmodetopoisonedmode.Acomplicatedbehaviorofthefilms'resistivityuponsputteringpowerisshown.